Basic Series

Desktop Optical Film Thickness Measurement Instrument · Basic Detection Device

Reflective Spectral Interference Thickness Measurement · Ten Band Configurations Optional · Non-contact and Non-destructive · Desktop Ready-to-measure

 

Product Introduction

The JINGYI Optoelectronics FILMTHICK-C10 series is a versatile precision measurement basic device designed for routine laboratory testing, basic scientific research measurements, and standard sample testing. The device utilizes reflective spectral interference thickness measurement principles. Its mechanical structure integrates an imported long-life halogen lamp light source, paired with a self-developed high-precision spectrometer. Using three inversion algorithms—FFT Fourier method, extremum method, and curve-fitting method—it achieves non-contact, non-destructive, high-precision measurements of samples, covering single and multi-layer film thickness, refractive index n, extinction coefficient k, reflectivity, and color.

The accompanying OPTICAFILMTEST optical film thickness measurement software includes a rich, open material refractive index database. During measurement, it can display interference, FFT spectra, and film thickness trends in real-time, assisting users in completing test analysis. The hardware adopts a modular design, allowing core components to be independently replaced for future function expansion and supports optional configurations across ten spectral bands. The product is suitable for thin-film thickness measurement in fields such as semiconductor films, liquid crystal displays, optical coatings, and biomedical applications.

 

Core Selling Points

Five optional spectral ranges: C10-UV 190-1100nm | C10-UVX 190-1700nm | C10-Basic 380-1100nm | C10-NIRX 380-1700nm | C10-NIR 950-1700nm, selectable according to film layer and substrate matching;

 

Wide measurement range coverage: Basic version 10nm-100μm, configurable to cover 1nm-250μm, enabling a single device to meet ultra-thin to medium-thick film requirements;

 

Sub-nanometer repeatability: Basic configuration film thickness repeatability ≤0.2nm; NIRX dual-detector configuration ≤0.02nm; film thickness stability better than 0.05nm;

 

Automatic switching of three algorithms: FFT Fourier method, extremum method, and curve-fitting method automatically switch according to film thickness range, simultaneously outputting thickness d, refractive index n, extinction coefficient k, and displaying fit residual curves;

 

Desktop ready-to-measure: Manual stage 200mm × 200mm, supporting samples from fragments up to wafers within 8 inches; single-point measurement <1 second (typically approx. 0.5 seconds);

Self-developed spectrometer and software: Spectral acquisition module uses self-developed JY-Spec series silicon-based CCD spectrometer; OPTICA FILMTEST measurement software independently developed, full Chinese interface, with three-level access control.

 

Model Configuration Overview (Selected According to Membrane Layer and Substrate Matching)

Optical Principles	Reflective spectroscopy interferometry, non-contact, non-destructive measurement
Wavelength Range	380-1100nm (basic version); optional 190-1100nm / 190-1700nm / 380-1700nm / 950-1700nm
Film Thickness Measurement Range	10nm - 100μm (basic version); depending on configuration, can reach 1nm - 250μm
Film Thickness Repeatability	≤0.2nm (standard configuration); ≤0.02nm (NIRX dual-detector configuration)
Film Thickness Absolute Accuracy	≤0.2% or 2nm (whichever is larger)
Film Thickness Stability	Better than 0.05nm
Measurement Spot	Standard 1.5mm; optional 1 / 3 / 5mm
Light Source	Imported halogen-tungsten lamp, lifetime ≥10,000 hours; optional deuterium-halogen combo extends to 190nm
Detector	VIS silicon-based CCD; NIRX configuration adds InGaAs detector (dual-detector seamless stitching)
Sample Stage	Desktop manual stage 200mm × 200mm, supports fragments up to 8-inch wafers
Single-Point Measurement Time	Less than 1 second (typically around 0.5 seconds)
Measurable Parameters	Film thickness d, reflectance spectrum R(λ), refractive index n, extinction coefficient k
Modeling Capability	Supports multi-layer stack modeling and layer-by-layer independent fitting, routine engineering films 1 to 5 layers
Material Database	Built-in hundreds of optical material constants (SiO₂, Si₃N₄, SiON, photoresist, PI, ITO, Al₂O₃, TiO₂, etc.), supports custom extensions
Data and Software	OPTICA FILMTEST software, Windows 10 / 11 64-bit; supports CSV / Excel / XML / PDF report export
Operating Environment	Temperature 18-28℃, humidity <80% no condensation; AC 220V±10%, 50Hz

 

Core Technical Parameters (Standard Configuration Indicators)

Model	Wavelength Range	Film Thickness Range	Light Source	Typical Applications
C10-UV	190-1100nm	1nm - 40μm	Deuterium Lamp   Tungsten-Halogen Lamp	Deep ultraviolet range, nanometer-scale thin films, semiconductors, and photoresists
C10-UVX	190-1700nm	1nm - 250μm	Deuterium Lamp   Tungsten-Halogen Lamp	Broad-spectrum ultra-wide range, suitable for multiple scenarios
C10-Basic model	380-1100nm	10nm - 100μm	Tungsten-Halogen Lamp	Standard visible light measurement, cost-effective
C10-NIRX	380-1700nm	10μm - 250μm	Tungsten-Halogen Lamp	From visible to near-infrared, thicker films and samples that absorb visible light
C10-NIR	950-1700nm	100μm - 250μm	Tungsten-Halogen Lamp	Near-infrared dedicated, thick film measurement

*The final right of interpretation of this technical specification belongs to the manufacturer.

 

Applicable Industries and Application Scenarios

Semiconductor Wafers and Photoresists

Optical Lenses and Filter Coatings

Liquid Crystal Display and OLED Coatings

Photovoltaic Anti-reflection Films and Functional Coatings

Eyeglass Lens Coatings

University Research and Third-party Testing

Typical Membrane Layer Measured Data

Samples and Film Layers	Measured Thickness	Application Areas
Photoresist	72nm	Semiconductor Lithography Processes
ITO (Indium Tin Oxide)	36nm	Touch Screens and Smart Windows
SiO₂ (Silicon Dioxide)	2108nm	Optical Coatings and Passivation Layers
Polyimide (PI) Film	162nm	Flexible Displays and OLED Substrates

*Accuracy and repeatability indicators were measured on standard 100 nm SiO₂/Si samples under ambient conditions of 23±2℃ at room temperature, with repeatability taken as the maximum value of 100 measurements. Detailed parameters for each model are subject to the corresponding specifications.

Standard Configuration

Host (including self-developed spectrometer and optical path)	1 unit
Imported halogen-tungsten lamp light source	1 set
Measurement software (pre-installed license, three-level permission management)	1 set
SiO₂/Si standard calibration samples	1 set
Chinese operation manual, software manual, and calibration certificate	1 set
Common tool kit and spare consumables	1 set
Remote diagnostics and online upgrade module	1 set
Transport packaging box	1 set

 

Service Commitment

Installation and Training	Provide online remote training and on-site installation services; after installation, operation training is conducted, covering instrument operation, software usage, measurement methods, and data analysis.
Warranty Period	One-year free warranty from the date of purchase; quality issues within the warranty period are repaired free of charge and faulty components are replaced; lifetime maintenance at cost price is provided after the warranty period.
Response Time	Response within 8 working hours on weekdays; first response within 4 hours in emergencies.
On-site Service Time	On-site service within 24 hours in Guangzhou and surrounding areas, within 48 hours in South China, and within 72 hours in major provincial capitals nationwide.
Spare Parts Support	Provide solutions for faulty components within 7 working days; commonly used consumables and vulnerable parts are stocked locally.
Calibration and Measurement	Provide national metrology institute or third-party traceable calibration certificates (CNAS optional).
Sample Testing	Before contract signing, free sample testing can be arranged, with actual measurement evaluation coefficients and repeatability data provided.
Software Upgrade	Free upgrades within the instrument’s service life (same model); remote diagnostics and online upgrade modules are provided.

 

 

Why Choose Jingyi Optoelectronics?

Independent R&D

The film thickness inversion algorithms (FFT Fourier method, extremum method, curve fitting method) and the OPTICAFILMTEST measurement software are all independently developed by our company; the spectral acquisition module uses a self-developed high-precision spectrometer.

 

National High-Tech Enterprise

Founded in 2013, our company is recognized as a National High-Tech Enterprise, a specialized and innovative enterprise, and a 'Little Giant' enterprise in technological innovation; we maintain long-term collaborations with universities and research institutes such as Tsinghua University and Peking University.

 

Localized Service

Our Guangzhou headquarters provides direct service nationwide, offering online remote training, on-site installation, remote fault diagnosis, and rapid spare parts delivery; the service chain is shorter compared to the indirect models of imported brands through agents.

 

Sample Testing Verification

Before signing a contract, we can arrange free sample testing, providing actual measurement evaluation coefficients and repeatability data as a basis for configuration confirmation and acceptance.

 

Consult customer service to obtain detailed materials and exclusive solutions.

Tel: 400-1800-685

Email:info@gzjygd.com